Stress control in masking layers for deep wet micromachining of Pyrex glass

• Main Authors: Iliescu, C., Miao, J., Tay, F.E.H.
• Other Authors: MECHANICAL ENGINEERING
• Format: Article
• Published: 2014
• Subjects: Amorphous silicon; Masking layer; Residual stress; Wet etching of glass
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/61382
• Institution: National University of Singapore

10.1016/j.sna.2004.03.004