Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching

Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching

10.1002/adma.201301555

Saved in:
Bibliographic Details
Main Authors: Zanchetta, E., Giustina, G.D., Grenci, G., Pozzato, A., Tormen, M., Brusatin, G.
Other Authors: MECHANOBIOLOGY INSTITUTE
Format: Article
Published: 2016
Subjects:
alumina
direct patterning
dry etching
etching masks
inorganic resists
sol-gel
Online Access:http://scholarbank.nus.edu.sg/handle/10635/128534
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/128534

Similar Items