Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching

Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching

10.1002/adma.201301555

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Bibliographic Details
Main Authors: Zanchetta, E., Giustina, G.D., Grenci, G., Pozzato, A., Tormen, M., Brusatin, G.
Other Authors: MECHANOBIOLOGY INSTITUTE
Format: Article
Published: 2016
Subjects:
alumina
direct patterning
dry etching
etching masks
inorganic resists
sol-gel
Online Access:http://scholarbank.nus.edu.sg/handle/10635/128534
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Institution: National University of Singapore
id sg-nus-scholar.10635-128534
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spelling sg-nus-scholar.10635-1285342024-11-14T11:16:57Z Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching Zanchetta, E. Giustina, G.D. Grenci, G. Pozzato, A. Tormen, M. Brusatin, G. MECHANOBIOLOGY INSTITUTE alumina direct patterning dry etching etching masks inorganic resists sol-gel 10.1002/adma.201301555 Advanced Materials 25 43 6261-6265 ADVME 2016-10-18T06:27:26Z 2016-10-18T06:27:26Z 2013-11-20 Article Zanchetta, E., Giustina, G.D., Grenci, G., Pozzato, A., Tormen, M., Brusatin, G. (2013-11-20). Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching. Advanced Materials 25 (43) : 6261-6265. ScholarBank@NUS Repository. https://doi.org/10.1002/adma.201301555 09359648 http://scholarbank.nus.edu.sg/handle/10635/128534 000330967800014 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic alumina
direct patterning
dry etching
etching masks
inorganic resists
sol-gel
spellingShingle alumina
direct patterning
dry etching
etching masks
inorganic resists
sol-gel
Zanchetta, E.
Giustina, G.D.
Grenci, G.
Pozzato, A.
Tormen, M.
Brusatin, G.
Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
description 10.1002/adma.201301555
author2 MECHANOBIOLOGY INSTITUTE
author_facet MECHANOBIOLOGY INSTITUTE
Zanchetta, E.
Giustina, G.D.
Grenci, G.
Pozzato, A.
Tormen, M.
Brusatin, G.
format Article
author Zanchetta, E.
Giustina, G.D.
Grenci, G.
Pozzato, A.
Tormen, M.
Brusatin, G.
author_sort Zanchetta, E.
title Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
title_short Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
title_full Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
title_fullStr Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
title_full_unstemmed Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
title_sort novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
publishDate 2016
url http://scholarbank.nus.edu.sg/handle/10635/128534
_version_ 1821190644155023360

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