Novel hybrid organic-inorganic spin-on resist for electron- or photon-based nanolithography with outstanding resistance to dry etching
10.1002/adma.201301555
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| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Article |
| Published: |
2016
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| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/128534 |
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| Institution: | National University of Singapore |