Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks

Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks

10.1016/j.tsf.2005.09.159

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Bibliographic Details
Main Authors: Liao, E.B., Teh, W.H., Teoh, K.W., Tay, A.A.O., Feng, H.H., Kumar, R.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
BCB
Etch rate
Selectivity
Sidewall profile
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85960
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/85960

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