Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
10.1016/j.tsf.2005.09.159
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| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
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| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/85960 |
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| Institution: | National University of Singapore |