Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)

Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)

10.1117/12.284614

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Bibliographic Details
Main Authors: Loong, S.Y., Lee, H.K., Chan, L., Zhou, M.S., Loh, F.C., Tan, K.L.
Other Authors: CHEMISTRY
Format: Conference or Workshop Item
Published: 2014
Subjects:
AFM
C/F ratio
C4F8
CF 4
CHF3
Fluorocarbon polymer
O2 strip
SiO2 etching
XPS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/95444
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/95444

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