An innovative way of etching MoS2: Characterization and mechanistic investigation

An innovative way of etching MoS2: Characterization and mechanistic investigation

10.1007/s12274-013-0296-8

Saved in:
Bibliographic Details
Main Authors: Huang, Y., Wu, J., Xu, X., Ho, Y., Ni, G., Zou, Q., Koon, G.K.W., Zhao, W., Castro Neto, A.H., Eda, G., Shen, C., Özyilmaz, B.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
etching
graphene
hexagonal
MoS2
photoluminescence
XeF2
Online Access:http://scholarbank.nus.edu.sg/handle/10635/95763
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/95763

Similar Items