An innovative way of etching MoS2: Characterization and mechanistic investigation

• Main Authors: Huang, Y., Wu, J., Xu, X., Ho, Y., Ni, G., Zou, Q., Koon, G.K.W., Zhao, W., Castro Neto, A.H., Eda, G., Shen, C., Özyilmaz, B.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Subjects: etching; graphene; hexagonal; MoS2; photoluminescence; XeF2
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/95763
• Institution: National University of Singapore

10.1007/s12274-013-0296-8