The decomposition mechanism of SiO2 with the deposition of oxygen-deficient M(Hf or Zr)Ox films

The decomposition mechanism of SiO2 with the deposition of oxygen-deficient M(Hf or Zr)Ox films

10.1016/j.tsf.2004.05.009

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Bibliographic Details
Main Authors: Li, Q., Wang, S.J., Lim, P.C., Chai, J.W., Huan, A.C.H., Ong, C.K.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Deposition
SiO2
XPS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/98251
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/98251

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