The decomposition mechanism of SiO2 with the deposition of oxygen-deficient M(Hf or Zr)Ox films

• Main Authors: Li, Q., Wang, S.J., Lim, P.C., Chai, J.W., Huan, A.C.H., Ong, C.K.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Subjects: Deposition; SiO2; XPS
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/98251
• Institution: National University of Singapore

10.1016/j.tsf.2004.05.009