Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)

• Main Authors: Loong, S.Y., Lee, H.K., Chan, L., Zhou, M.S., Loh, F.C., Tan, K.L.
• Other Authors: CHEMISTRY
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: AFM; C/F ratio; C4F8; CF 4; CHF3; Fluorocarbon polymer; O2 strip; SiO2 etching; XPS
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/95444
• Institution: National University of Singapore

10.1117/12.284614