Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)

Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)

10.1117/12.284614

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Bibliographic Details
Main Authors: Loong, S.Y., Lee, H.K., Chan, L., Zhou, M.S., Loh, F.C., Tan, K.L.
Other Authors: CHEMISTRY
Format: Conference or Workshop Item
Published: 2014
Subjects:
AFM
C/F ratio
C4F8
CF 4
CHF3
Fluorocarbon polymer
O2 strip
SiO2 etching
XPS
Online Access:http://scholarbank.nus.edu.sg/handle/10635/95444
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Institution: National University of Singapore
id sg-nus-scholar.10635-95444
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spelling sg-nus-scholar.10635-954442023-10-29T20:35:49Z Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8) Loong, S.Y. Lee, H.K. Chan, L. Zhou, M.S. Loh, F.C. Tan, K.L. CHEMISTRY PHYSICS AFM C/F ratio C4F8 CF 4 CHF3 Fluorocarbon polymer O2 strip SiO2 etching XPS 10.1117/12.284614 Proceedings of SPIE - The International Society for Optical Engineering 3212 376-382 PSISD 2014-10-16T08:47:55Z 2014-10-16T08:47:55Z 1997 Conference Paper Loong, S.Y., Lee, H.K., Chan, L., Zhou, M.S., Loh, F.C., Tan, K.L. (1997). Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8). Proceedings of SPIE - The International Society for Optical Engineering 3212 : 376-382. ScholarBank@NUS Repository. https://doi.org/10.1117/12.284614 0277786X http://scholarbank.nus.edu.sg/handle/10635/95444 A1997BJ64W00042 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic AFM
C/F ratio
C4F8
CF 4
CHF3
Fluorocarbon polymer
O2 strip
SiO2 etching
XPS
spellingShingle AFM
C/F ratio
C4F8
CF 4
CHF3
Fluorocarbon polymer
O2 strip
SiO2 etching
XPS
Loong, S.Y.
Lee, H.K.
Chan, L.
Zhou, M.S.
Loh, F.C.
Tan, K.L.
Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)
description 10.1117/12.284614
author2 CHEMISTRY
author_facet CHEMISTRY
Loong, S.Y.
Lee, H.K.
Chan, L.
Zhou, M.S.
Loh, F.C.
Tan, K.L.
format Conference or Workshop Item
author Loong, S.Y.
Lee, H.K.
Chan, L.
Zhou, M.S.
Loh, F.C.
Tan, K.L.
author_sort Loong, S.Y.
title Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)
title_short Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)
title_full Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)
title_fullStr Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)
title_full_unstemmed Characterization of polymer formation during SiO2 etching with different fluorocarbon gases (CHF3, CF4, C 4F8)
title_sort characterization of polymer formation during sio2 etching with different fluorocarbon gases (chf3, cf4, c 4f8)
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/95444
_version_ 1781786266767982592

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