Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks

10.1016/j.tsf.2005.09.159

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Bibliographic Details
Main Authors:	Liao, E.B., Teh, W.H., Teoh, K.W., Tay, A.A.O., Feng, H.H., Kumar, R.
Other Authors:	MECHANICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	BCB Etch rate Selectivity Sidewall profile
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/85960
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-85960
record_format	dspace
spelling	sg-nus-scholar.10635-859602023-10-26T22:02:20Z Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks Liao, E.B. Teh, W.H. Teoh, K.W. Tay, A.A.O. Feng, H.H. Kumar, R. MECHANICAL ENGINEERING BCB Etch rate Selectivity Sidewall profile 10.1016/j.tsf.2005.09.159 Thin Solid Films 504 1-2 252-256 THSFA 2014-10-07T09:14:13Z 2014-10-07T09:14:13Z 2006-05-10 Conference Paper Liao, E.B., Teh, W.H., Teoh, K.W., Tay, A.A.O., Feng, H.H., Kumar, R. (2006-05-10). Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks. Thin Solid Films 504 (1-2) : 252-256. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2005.09.159 00406090 http://scholarbank.nus.edu.sg/handle/10635/85960 000236486200060 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	BCB Etch rate Selectivity Sidewall profile
spellingShingle	BCB Etch rate Selectivity Sidewall profile Liao, E.B. Teh, W.H. Teoh, K.W. Tay, A.A.O. Feng, H.H. Kumar, R. Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
description	10.1016/j.tsf.2005.09.159
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Liao, E.B. Teh, W.H. Teoh, K.W. Tay, A.A.O. Feng, H.H. Kumar, R.
format	Conference or Workshop Item
author	Liao, E.B. Teh, W.H. Teoh, K.W. Tay, A.A.O. Feng, H.H. Kumar, R.
author_sort	Liao, E.B.
title	Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
title_short	Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
title_full	Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
title_fullStr	Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
title_full_unstemmed	Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks
title_sort	etching control of benzocyclobutene in cf4 / o2 and sf6 / o2 plasmas with thick photoresist and titanium masks
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/85960
_version_	1781784789166063616

Etching control of benzocyclobutene in CF4 / O2 and SF6 / O2 plasmas with thick photoresist and titanium masks

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