Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations

Journal of Applied Physics

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Bibliographic Details
Main Authors:	Choi, W.K., Han, K.K., Choo, C.K., Chim, W.K., Lu, Y.F.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/61960
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-61960
record_format	dspace
spelling	sg-nus-scholar.10635-619602015-04-21T12:42:08Z Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations Choi, W.K. Han, K.K. Choo, C.K. Chim, W.K. Lu, Y.F. ELECTRICAL ENGINEERING Journal of Applied Physics 83 9 4810-4815 JAPIA 2014-06-17T06:45:53Z 2014-06-17T06:45:53Z 1998-05-01 Article Choi, W.K.,Han, K.K.,Choo, C.K.,Chim, W.K.,Lu, Y.F. (1998-05-01). Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations. Journal of Applied Physics 83 (9) : 4810-4815. ScholarBank@NUS Repository. 00218979 http://scholarbank.nus.edu.sg/handle/10635/61960 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Journal of Applied Physics
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Choi, W.K. Han, K.K. Choo, C.K. Chim, W.K. Lu, Y.F.
format	Article
author	Choi, W.K. Han, K.K. Choo, C.K. Chim, W.K. Lu, Y.F.
spellingShingle	Choi, W.K. Han, K.K. Choo, C.K. Chim, W.K. Lu, Y.F. Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
author_sort	Choi, W.K.
title	Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
title_short	Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
title_full	Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
title_fullStr	Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
title_full_unstemmed	Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
title_sort	conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/61960
_version_	1681085688528764928

Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations

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