Conduction mechanisms and interface property of silicon oxide films sputtered under different oxygen concentrations
Journal of Applied Physics
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Main Authors: | Choi, W.K., Han, K.K., Choo, C.K., Chim, W.K., Lu, Y.F. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/61960 |
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Institution: | National University of Singapore |
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