Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing

Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing

10.1063/1.1891290

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Bibliographic Details
Main Authors: Choi, W.K., Ho, V., Ng, V., Ho, Y.W., Ng, S.P., Chim, W.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56134
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/56134

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