Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing

10.1063/1.1891290

Saved in:
Bibliographic Details
Main Authors: Choi, W.K., Ho, V., Ng, V., Ho, Y.W., Ng, S.P., Chim, W.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56134
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-56134
record_format dspace
spelling sg-nus-scholar.10635-561342023-10-25T21:34:16Z Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing Choi, W.K. Ho, V. Ng, V. Ho, Y.W. Ng, S.P. Chim, W.K. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1891290 Applied Physics Letters 86 14 1-3 APPLA 2014-06-17T02:51:07Z 2014-06-17T02:51:07Z 2005-04-04 Article Choi, W.K., Ho, V., Ng, V., Ho, Y.W., Ng, S.P., Chim, W.K. (2005-04-04). Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing. Applied Physics Letters 86 (14) : 1-3. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1891290 00036951 http://scholarbank.nus.edu.sg/handle/10635/56134 000228242700058 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.1891290
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Choi, W.K.
Ho, V.
Ng, V.
Ho, Y.W.
Ng, S.P.
Chim, W.K.
format Article
author Choi, W.K.
Ho, V.
Ng, V.
Ho, Y.W.
Ng, S.P.
Chim, W.K.
spellingShingle Choi, W.K.
Ho, V.
Ng, V.
Ho, Y.W.
Ng, S.P.
Chim, W.K.
Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
author_sort Choi, W.K.
title Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
title_short Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
title_full Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
title_fullStr Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
title_full_unstemmed Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
title_sort germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/56134
_version_ 1781781115793571840