Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealing

Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealing

10.1016/j.jcrysgro.2005.12.033

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Bibliographic Details
Main Authors: Choi, W.K., Chew, H.G., Ho, V., Ng, V., Chim, W.K., Ho, Y.W., Ng, S.P.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
A1. Ge nanocrystals
A2. Rapid thermal annealing
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70365
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/70365

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