Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealing

Formation of germanium nanocrystals in thick silicon oxide matrix on silicon substrate under rapid thermal annealing

10.1016/j.jcrysgro.2005.12.033

Saved in:
Bibliographic Details
Main Authors: Choi, W.K., Chew, H.G., Ho, V., Ng, V., Chim, W.K., Ho, Y.W., Ng, S.P.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
A1. Ge nanocrystals
A2. Rapid thermal annealing
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70365
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Similar Items

Similar Items