Germanium diffusion and nanocrystal formation in silicon oxide on silicon substrate under rapid thermal annealing

10.1063/1.1891290

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Bibliographic Details
Main Authors: Choi, W.K., Ho, V., Ng, V., Ho, Y.W., Ng, S.P., Chim, W.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56134
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Institution: National University of Singapore

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