Effect of rapid thermal annealing on the structural and electrical properties of a silicon-silicon oxide system

10.1063/1.359844

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Bibliographic Details
Main Authors: Choi, W.K., Chan, Y.M., Ah, L.K., Loh, F.C., Tan, K.L., Ramam, A.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80368
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Institution: National University of Singapore