Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix

Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix

10.1088/0957-4484/17/8/028

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Bibliographic Details
Main Authors: Chew, H.G., Choi, W.K., Foo, Y.L., Zheng, F., Chim, W.K., Voon, Z.J., Seow, K.C., Fitzgerald, E.A., Lai, D.M.Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82199
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/82199

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