Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix
10.1088/0957-4484/17/8/028
Saved in:
Main Authors: | , , , , , , , , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82199 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-82199 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-821992023-10-29T23:12:46Z Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix Chew, H.G. Choi, W.K. Foo, Y.L. Zheng, F. Chim, W.K. Voon, Z.J. Seow, K.C. Fitzgerald, E.A. Lai, D.M.Y. ELECTRICAL & COMPUTER ENGINEERING 10.1088/0957-4484/17/8/028 Nanotechnology 17 8 1964-1968 NNOTE 2014-10-07T04:26:32Z 2014-10-07T04:26:32Z 2006-04-28 Article Chew, H.G., Choi, W.K., Foo, Y.L., Zheng, F., Chim, W.K., Voon, Z.J., Seow, K.C., Fitzgerald, E.A., Lai, D.M.Y. (2006-04-28). Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix. Nanotechnology 17 (8) : 1964-1968. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-4484/17/8/028 09574484 http://scholarbank.nus.edu.sg/handle/10635/82199 000237813000029 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
description |
10.1088/0957-4484/17/8/028 |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING Chew, H.G. Choi, W.K. Foo, Y.L. Zheng, F. Chim, W.K. Voon, Z.J. Seow, K.C. Fitzgerald, E.A. Lai, D.M.Y. |
format |
Article |
author |
Chew, H.G. Choi, W.K. Foo, Y.L. Zheng, F. Chim, W.K. Voon, Z.J. Seow, K.C. Fitzgerald, E.A. Lai, D.M.Y. |
spellingShingle |
Chew, H.G. Choi, W.K. Foo, Y.L. Zheng, F. Chim, W.K. Voon, Z.J. Seow, K.C. Fitzgerald, E.A. Lai, D.M.Y. Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix |
author_sort |
Chew, H.G. |
title |
Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix |
title_short |
Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix |
title_full |
Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix |
title_fullStr |
Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix |
title_full_unstemmed |
Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix |
title_sort |
effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/82199 |
_version_ |
1781784078921498624 |