Effect of germanium concentration and oxide diffusion barrier on the formation and distribution of germanium nanocrystals in silicon oxide matrix
10.1088/0957-4484/17/8/028
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Main Authors: | Chew, H.G., Choi, W.K., Foo, Y.L., Zheng, F., Chim, W.K., Voon, Z.J., Seow, K.C., Fitzgerald, E.A., Lai, D.M.Y. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82199 |
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Institution: | National University of Singapore |
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