Relaxation of trapped charge at silicon grain boundary states
Solid State Electronics
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sg-nus-scholar.10635-627032015-04-06T10:46:26Z Relaxation of trapped charge at silicon grain boundary states Ling, C.H. Kwok, C.Y. Woo, P.K. ELECTRICAL ENGINEERING Solid State Electronics 30 3 247-252 SSELA 2014-06-17T06:53:57Z 2014-06-17T06:53:57Z 1987-03 Article Ling, C.H.,Kwok, C.Y.,Woo, P.K. (1987-03). Relaxation of trapped charge at silicon grain boundary states. Solid State Electronics 30 (3) : 247-252. ScholarBank@NUS Repository. 00381101 http://scholarbank.nus.edu.sg/handle/10635/62703 NOT_IN_WOS Scopus |
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Solid State Electronics |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Ling, C.H. Kwok, C.Y. Woo, P.K. |
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Ling, C.H. Kwok, C.Y. Woo, P.K. |
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Ling, C.H. Kwok, C.Y. Woo, P.K. Relaxation of trapped charge at silicon grain boundary states |
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Ling, C.H. |
title |
Relaxation of trapped charge at silicon grain boundary states |
title_short |
Relaxation of trapped charge at silicon grain boundary states |
title_full |
Relaxation of trapped charge at silicon grain boundary states |
title_fullStr |
Relaxation of trapped charge at silicon grain boundary states |
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Relaxation of trapped charge at silicon grain boundary states |
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relaxation of trapped charge at silicon grain boundary states |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/62703 |
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