Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Bibliographic Details
Main Authors:	Zhao, Y., Khursheed, A.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/62920
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-62920
record_format	dspace
spelling	sg-nus-scholar.10635-629202024-11-09T02:43:21Z Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems Zhao, Y. Khursheed, A. ELECTRICAL ENGINEERING Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 17 6 2795-2796 JVTBD 2014-06-17T06:56:21Z 2014-06-17T06:56:21Z 1999 Article Zhao, Y.,Khursheed, A. (1999). Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 17 (6) : 2795-2796. ScholarBank@NUS Repository. 10711023 http://scholarbank.nus.edu.sg/handle/10635/62920 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Zhao, Y. Khursheed, A.
format	Article
author	Zhao, Y. Khursheed, A.
spellingShingle	Zhao, Y. Khursheed, A. Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
author_sort	Zhao, Y.
title	Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_short	Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_full	Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_fullStr	Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_full_unstemmed	Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
title_sort	variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/62920
_version_	1821195346386092032

Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems

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