Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing

10.1063/1.2981197

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Bibliographic Details
Main Authors:	Miyake, M., Scott, J.F., Lou, X.J., Morrison, F.D., Nonaka, T., Motoyama, S., Tatsuta, T., Tsuji, O.
Other Authors:	MATERIALS SCIENCE AND ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/65015
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-65015
record_format	dspace
spelling	sg-nus-scholar.10635-650152023-10-30T09:43:20Z Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing Miyake, M. Scott, J.F. Lou, X.J. Morrison, F.D. Nonaka, T. Motoyama, S. Tatsuta, T. Tsuji, O. MATERIALS SCIENCE AND ENGINEERING 10.1063/1.2981197 Journal of Applied Physics 104 6 - JAPIA 2014-06-17T08:00:10Z 2014-06-17T08:00:10Z 2008 Article Miyake, M., Scott, J.F., Lou, X.J., Morrison, F.D., Nonaka, T., Motoyama, S., Tatsuta, T., Tsuji, O. (2008). Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing. Journal of Applied Physics 104 (6) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2981197 00218979 http://scholarbank.nus.edu.sg/handle/10635/65015 000260119300109 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.2981197
author2	MATERIALS SCIENCE AND ENGINEERING
author_facet	MATERIALS SCIENCE AND ENGINEERING Miyake, M. Scott, J.F. Lou, X.J. Morrison, F.D. Nonaka, T. Motoyama, S. Tatsuta, T. Tsuji, O.
format	Article
author	Miyake, M. Scott, J.F. Lou, X.J. Morrison, F.D. Nonaka, T. Motoyama, S. Tatsuta, T. Tsuji, O.
spellingShingle	Miyake, M. Scott, J.F. Lou, X.J. Morrison, F.D. Nonaka, T. Motoyama, S. Tatsuta, T. Tsuji, O. Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing
author_sort	Miyake, M.
title	Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing
title_short	Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing
title_full	Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing
title_fullStr	Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing
title_full_unstemmed	Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing
title_sort	submicron three-dimensional trenched electrodes and capacitors for drams and frams: fabrication and electrical testing
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/65015
_version_	1781782545785946112

Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing

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