Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing

Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing

10.1063/1.2981197

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Bibliographic Details
Main Authors: Miyake, M., Scott, J.F., Lou, X.J., Morrison, F.D., Nonaka, T., Motoyama, S., Tatsuta, T., Tsuji, O.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/65015
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/65015

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