Dependence of substrate orientation and etching conditions on the formation of Si nanowires

10.1063/1.3587004

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Bibliographic Details
Main Authors:	Tan, L.T., Huang, M.H., Chong, T.S., Ong, C.S., Myo, T.S., Wee, Q., Soh, C.B., Chua, S.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	electroless etching Nanowire silicon
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/69808
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-69808
record_format	dspace
spelling	sg-nus-scholar.10635-698082023-10-26T07:22:42Z Dependence of substrate orientation and etching conditions on the formation of Si nanowires Tan, L.T. Huang, M.H. Chong, T.S. Ong, C.S. Myo, T.S. Wee, Q. Soh, C.B. Chua, S.J. ELECTRICAL & COMPUTER ENGINEERING electroless etching Nanowire silicon 10.1063/1.3587004 AIP Conference Proceedings 1341 292-295 2014-06-19T03:04:52Z 2014-06-19T03:04:52Z 2011 Conference Paper Tan, L.T., Huang, M.H., Chong, T.S., Ong, C.S., Myo, T.S., Wee, Q., Soh, C.B., Chua, S.J. (2011). Dependence of substrate orientation and etching conditions on the formation of Si nanowires. AIP Conference Proceedings 1341 : 292-295. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3587004 9780735408975 0094243X http://scholarbank.nus.edu.sg/handle/10635/69808 000291830600062 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	electroless etching Nanowire silicon
spellingShingle	electroless etching Nanowire silicon Tan, L.T. Huang, M.H. Chong, T.S. Ong, C.S. Myo, T.S. Wee, Q. Soh, C.B. Chua, S.J. Dependence of substrate orientation and etching conditions on the formation of Si nanowires
description	10.1063/1.3587004
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tan, L.T. Huang, M.H. Chong, T.S. Ong, C.S. Myo, T.S. Wee, Q. Soh, C.B. Chua, S.J.
format	Conference or Workshop Item
author	Tan, L.T. Huang, M.H. Chong, T.S. Ong, C.S. Myo, T.S. Wee, Q. Soh, C.B. Chua, S.J.
author_sort	Tan, L.T.
title	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_short	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_full	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_fullStr	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_full_unstemmed	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_sort	dependence of substrate orientation and etching conditions on the formation of si nanowires
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/69808
_version_	1781783117764231168

Dependence of substrate orientation and etching conditions on the formation of Si nanowires

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