Dependence of substrate orientation and etching conditions on the formation of Si nanowires

Dependence of substrate orientation and etching conditions on the formation of Si nanowires

10.1063/1.3587004

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Bibliographic Details
Main Authors: Tan, L.T., Huang, M.H., Chong, T.S., Ong, C.S., Myo, T.S., Wee, Q., Soh, C.B., Chua, S.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
electroless etching
Nanowire
silicon
Online Access:http://scholarbank.nus.edu.sg/handle/10635/69808
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Institution: National University of Singapore

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