Equipment design and control of advanced thermal processing system in lithography
10.1109/IECON.2007.4460095
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sg-nus-scholar.10635-701932023-10-30T07:34:35Z Equipment design and control of advanced thermal processing system in lithography Tay, A. Wang, Y. Chua, H.T. ELECTRICAL & COMPUTER ENGINEERING 10.1109/IECON.2007.4460095 IECON Proceedings (Industrial Electronics Conference) 786-791 IEPRE 2014-06-19T03:09:19Z 2014-06-19T03:09:19Z 2007 Conference Paper Tay, A., Wang, Y., Chua, H.T. (2007). Equipment design and control of advanced thermal processing system in lithography. IECON Proceedings (Industrial Electronics Conference) : 786-791. ScholarBank@NUS Repository. https://doi.org/10.1109/IECON.2007.4460095 1424407834 http://scholarbank.nus.edu.sg/handle/10635/70193 000253451400138 Scopus |
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10.1109/IECON.2007.4460095 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Tay, A. Wang, Y. Chua, H.T. |
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Conference or Workshop Item |
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Tay, A. Wang, Y. Chua, H.T. |
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Tay, A. Wang, Y. Chua, H.T. Equipment design and control of advanced thermal processing system in lithography |
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Tay, A. |
title |
Equipment design and control of advanced thermal processing system in lithography |
title_short |
Equipment design and control of advanced thermal processing system in lithography |
title_full |
Equipment design and control of advanced thermal processing system in lithography |
title_fullStr |
Equipment design and control of advanced thermal processing system in lithography |
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Equipment design and control of advanced thermal processing system in lithography |
title_sort |
equipment design and control of advanced thermal processing system in lithography |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/70193 |
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1781783144738848768 |