Iterative feedback tuning of optical proximity correction mask in lithography
10.1109/SII.2011.6147560
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sg-nus-scholar.10635-707102015-01-12T00:26:35Z Iterative feedback tuning of optical proximity correction mask in lithography Qu, Y. Tay, A. Lee, T.H. ELECTRICAL & COMPUTER ENGINEERING 10.1109/SII.2011.6147560 2011 IEEE/SICE International Symposium on System Integration, SII 2011 851-856 2014-06-19T03:15:19Z 2014-06-19T03:15:19Z 2011 Conference Paper Qu, Y.,Tay, A.,Lee, T.H. (2011). Iterative feedback tuning of optical proximity correction mask in lithography. 2011 IEEE/SICE International Symposium on System Integration, SII 2011 : 851-856. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/SII.2011.6147560" target="_blank">https://doi.org/10.1109/SII.2011.6147560</a> 9781457715235 http://scholarbank.nus.edu.sg/handle/10635/70710 NOT_IN_WOS Scopus |
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10.1109/SII.2011.6147560 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Qu, Y. Tay, A. Lee, T.H. |
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Conference or Workshop Item |
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Qu, Y. Tay, A. Lee, T.H. |
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Qu, Y. Tay, A. Lee, T.H. Iterative feedback tuning of optical proximity correction mask in lithography |
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Qu, Y. |
title |
Iterative feedback tuning of optical proximity correction mask in lithography |
title_short |
Iterative feedback tuning of optical proximity correction mask in lithography |
title_full |
Iterative feedback tuning of optical proximity correction mask in lithography |
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Iterative feedback tuning of optical proximity correction mask in lithography |
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Iterative feedback tuning of optical proximity correction mask in lithography |
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iterative feedback tuning of optical proximity correction mask in lithography |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/70710 |
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