Iterative feedback tuning of optical proximity correction mask in lithography

10.1109/SII.2011.6147560

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Bibliographic Details
Main Authors: Qu, Y., Tay, A., Lee, T.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70710
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-707102015-01-12T00:26:35Z Iterative feedback tuning of optical proximity correction mask in lithography Qu, Y. Tay, A. Lee, T.H. ELECTRICAL & COMPUTER ENGINEERING 10.1109/SII.2011.6147560 2011 IEEE/SICE International Symposium on System Integration, SII 2011 851-856 2014-06-19T03:15:19Z 2014-06-19T03:15:19Z 2011 Conference Paper Qu, Y.,Tay, A.,Lee, T.H. (2011). Iterative feedback tuning of optical proximity correction mask in lithography. 2011 IEEE/SICE International Symposium on System Integration, SII 2011 : 851-856. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/SII.2011.6147560" target="_blank">https://doi.org/10.1109/SII.2011.6147560</a> 9781457715235 http://scholarbank.nus.edu.sg/handle/10635/70710 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1109/SII.2011.6147560
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Qu, Y.
Tay, A.
Lee, T.H.
format Conference or Workshop Item
author Qu, Y.
Tay, A.
Lee, T.H.
spellingShingle Qu, Y.
Tay, A.
Lee, T.H.
Iterative feedback tuning of optical proximity correction mask in lithography
author_sort Qu, Y.
title Iterative feedback tuning of optical proximity correction mask in lithography
title_short Iterative feedback tuning of optical proximity correction mask in lithography
title_full Iterative feedback tuning of optical proximity correction mask in lithography
title_fullStr Iterative feedback tuning of optical proximity correction mask in lithography
title_full_unstemmed Iterative feedback tuning of optical proximity correction mask in lithography
title_sort iterative feedback tuning of optical proximity correction mask in lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/70710
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