Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation

10.1109/IWJT.2007.4279954

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Bibliographic Details
Main Authors:	Chi, D.Z., Yao, H.B., Liew, S.L., Tan, C.C., Chua, C.T., Chua, K.C., Li, R., Lee, S.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71716
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-71716
record_format	dspace
spelling	sg-nus-scholar.10635-717162024-11-10T21:13:25Z Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation Chi, D.Z. Yao, H.B. Liew, S.L. Tan, C.C. Chua, C.T. Chua, K.C. Li, R. Lee, S.J. ELECTRICAL & COMPUTER ENGINEERING 10.1109/IWJT.2007.4279954 Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007 81-86 2014-06-19T03:26:56Z 2014-06-19T03:26:56Z 2007 Conference Paper Chi, D.Z.,Yao, H.B.,Liew, S.L.,Tan, C.C.,Chua, C.T.,Chua, K.C.,Li, R.,Lee, S.J. (2007). Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation. Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007 : 81-86. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/IWJT.2007.4279954" target="_blank">https://doi.org/10.1109/IWJT.2007.4279954</a> 1424411033 http://scholarbank.nus.edu.sg/handle/10635/71716 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/IWJT.2007.4279954
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Chi, D.Z. Yao, H.B. Liew, S.L. Tan, C.C. Chua, C.T. Chua, K.C. Li, R. Lee, S.J.
format	Conference or Workshop Item
author	Chi, D.Z. Yao, H.B. Liew, S.L. Tan, C.C. Chua, C.T. Chua, K.C. Li, R. Lee, S.J.
spellingShingle	Chi, D.Z. Yao, H.B. Liew, S.L. Tan, C.C. Chua, C.T. Chua, K.C. Li, R. Lee, S.J. Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation
author_sort	Chi, D.Z.
title	Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation
title_short	Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation
title_full	Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation
title_fullStr	Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation
title_full_unstemmed	Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation
title_sort	schottky barrier height in germanide/ge contacts and its engineering through germanidation induced dopant segregation
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/71716
_version_	1821201218133819392

Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation

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