Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

Saved in:

Bibliographic Details
Main Authors:	Oh, G.G., Chim, W.K., Chan, D.S.H., Lou, C.L.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/72913
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-72913
record_format	dspace
spelling	sg-nus-scholar.10635-729132015-02-06T20:22:50Z Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing Oh, G.G. Chim, W.K. Chan, D.S.H. Lou, C.L. ELECTRICAL ENGINEERING Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 99-103 00234 2014-06-19T05:13:25Z 2014-06-19T05:13:25Z 1999 Conference Paper Oh, G.G.,Chim, W.K.,Chan, D.S.H.,Lou, C.L. (1999). Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 99-103. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/72913 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Oh, G.G. Chim, W.K. Chan, D.S.H. Lou, C.L.
format	Conference or Workshop Item
author	Oh, G.G. Chim, W.K. Chan, D.S.H. Lou, C.L.
spellingShingle	Oh, G.G. Chim, W.K. Chan, D.S.H. Lou, C.L. Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
author_sort	Oh, G.G.
title	Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_short	Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_full	Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_fullStr	Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_full_unstemmed	Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_sort	series resistance and effective channel mobility degradation in ldd nmosfets under hot-carrier stressing
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/72913
_version_	1681087652168728576

Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing

Similar Items