Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines

10.1149/1.1391174

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Bibliographic Details
Main Authors:	Pey, K.L., Chua, H.N., Siah, S.Y.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80365
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-80365
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spelling	sg-nus-scholar.10635-803652024-11-11T14:21:40Z Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines Pey, K.L. Chua, H.N. Siah, S.Y. ELECTRICAL ENGINEERING 10.1149/1.1391174 Electrochemical and Solid-State Letters 3 9 442-445 ESLEF 2014-10-07T02:56:44Z 2014-10-07T02:56:44Z 2000-09 Article Pey, K.L.,Chua, H.N.,Siah, S.Y. (2000-09). Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines. Electrochemical and Solid-State Letters 3 (9) : 442-445. ScholarBank@NUS Repository. <a href="https://doi.org/10.1149/1.1391174" target="_blank">https://doi.org/10.1149/1.1391174</a> 10990062 http://scholarbank.nus.edu.sg/handle/10635/80365 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.1391174
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Pey, K.L. Chua, H.N. Siah, S.Y.
format	Article
author	Pey, K.L. Chua, H.N. Siah, S.Y.
spellingShingle	Pey, K.L. Chua, H.N. Siah, S.Y. Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines
author_sort	Pey, K.L.
title	Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines
title_short	Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines
title_full	Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines
title_fullStr	Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines
title_full_unstemmed	Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines
title_sort	effect of bf2 + implantation on void formation in ti-salicided narrow polysilicon lines
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80365
_version_	1821197985811267584

Effect of BF2 + implantation on void formation in Ti-salicided narrow polysilicon lines

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