Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers

Applied Physics Letters

محفوظ في:
التفاصيل البيبلوغرافية
المؤلفون الرئيسيون: Senapati, B., Samanta, S.K., Maikap, S., Bera, L.K., Maiti, C.K.
مؤلفون آخرون: ELECTRICAL ENGINEERING
التنسيق: مقال
منشور في: 2014
الوصول للمادة أونلاين:http://scholarbank.nus.edu.sg/handle/10635/80378
الوسوم: إضافة وسم
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المؤسسة: National University of Singapore
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spelling sg-nus-scholar.10635-803782024-11-08T19:05:22Z Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers Senapati, B. Samanta, S.K. Maikap, S. Bera, L.K. Maiti, C.K. ELECTRICAL ENGINEERING Applied Physics Letters 77 12 1840-1842 APPLA 2014-10-07T02:56:53Z 2014-10-07T02:56:53Z 2000-09-18 Article Senapati, B.,Samanta, S.K.,Maikap, S.,Bera, L.K.,Maiti, C.K. (2000-09-18). Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers. Applied Physics Letters 77 (12) : 1840-1842. ScholarBank@NUS Repository. 00036951 http://scholarbank.nus.edu.sg/handle/10635/80378 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description Applied Physics Letters
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Senapati, B.
Samanta, S.K.
Maikap, S.
Bera, L.K.
Maiti, C.K.
format Article
author Senapati, B.
Samanta, S.K.
Maikap, S.
Bera, L.K.
Maiti, C.K.
spellingShingle Senapati, B.
Samanta, S.K.
Maikap, S.
Bera, L.K.
Maiti, C.K.
Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers
author_sort Senapati, B.
title Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers
title_short Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers
title_full Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers
title_fullStr Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers
title_full_unstemmed Effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-Si1-xGex layers
title_sort effects of nitric-oxide-plasma treatment on the electrical properties of tetraethylorthosilicate-deposited silicon dioxides on strained-si1-xgex layers
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/80378
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