Rapid thermal oxidation of radio frequency sputtered polycrystalline Si1-xGex thin films

Rapid thermal oxidation of radio frequency sputtered polycrystalline Si1-xGex thin films

10.1016/S0038-1101(01)00240-4

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Bibliographic Details
Main Authors: Natarajan, A., Bera, L.K., Choi, W.K., Osipowicz, T., Seng, H.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Oxidation
Polycrystalline SiGe films
Radio frequency sputtered
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82968
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/82968

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