Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
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sg-nus-scholar.10635-810972015-02-02T04:30:23Z Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser Zheng, Y.-W. Lu, Y.-F. Mai, Z.-H. Song, W.-D. ELECTRICAL ENGINEERING DATA STORAGE INSTITUTE Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 39 10 5894-5898 JAPND 2014-10-07T03:04:38Z 2014-10-07T03:04:38Z 2000-10 Article Zheng, Y.-W.,Lu, Y.-F.,Mai, Z.-H.,Song, W.-D. (2000-10). Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 39 (10) : 5894-5898. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/81097 NOT_IN_WOS Scopus |
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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Zheng, Y.-W. Lu, Y.-F. Mai, Z.-H. Song, W.-D. |
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Zheng, Y.-W. Lu, Y.-F. Mai, Z.-H. Song, W.-D. |
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Zheng, Y.-W. Lu, Y.-F. Mai, Z.-H. Song, W.-D. Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser |
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Zheng, Y.-W. |
title |
Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser |
title_short |
Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser |
title_full |
Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser |
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Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser |
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Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser |
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removing spherical silica particles from si, ge and nip substrates by krf excimer laser |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/81097 |
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1681089009431871488 |