Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate

Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA

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Main Authors:	Low, C.L., Chim, W.K., Chan, D.S.H., Pan, Y.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81390
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-813902015-01-26T22:36:49Z Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate Low, C.L. Chim, W.K. Chan, D.S.H. Pan, Y. ELECTRICAL ENGINEERING Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA 102-105 234 2014-10-07T03:07:48Z 2014-10-07T03:07:48Z 1995 Conference Paper Low, C.L.,Chim, W.K.,Chan, D.S.H.,Pan, Y. (1995). Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate. Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA : 102-105. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/81390 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Low, C.L. Chim, W.K. Chan, D.S.H. Pan, Y.
format	Conference or Workshop Item
author	Low, C.L. Chim, W.K. Chan, D.S.H. Pan, Y.
spellingShingle	Low, C.L. Chim, W.K. Chan, D.S.H. Pan, Y. Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate
author_sort	Low, C.L.
title	Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate
title_short	Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate
title_full	Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate
title_fullStr	Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate
title_full_unstemmed	Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate
title_sort	comparative study on the channel hot-carrier degradation of n- and p-mosfets with cvd tungsten polycide gate
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81390
_version_	1681089062510788608

Comparative study on the channel hot-carrier degradation of N- and P-MOSFETs with CVD tungsten polycide gate

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