Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Main Authors: Oh, G.G., Chim, W.K., Chan, D.S.H., Lou, C.L.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81737
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-817372015-01-07T14:20:01Z Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing Oh, G.G. Chim, W.K. Chan, D.S.H. Lou, C.L. ELECTRICAL ENGINEERING Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 99-103 234 2014-10-07T03:11:29Z 2014-10-07T03:11:29Z 1999 Conference Paper Oh, G.G.,Chim, W.K.,Chan, D.S.H.,Lou, C.L. (1999). Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 99-103. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/81737 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Oh, G.G.
Chim, W.K.
Chan, D.S.H.
Lou, C.L.
format Conference or Workshop Item
author Oh, G.G.
Chim, W.K.
Chan, D.S.H.
Lou, C.L.
spellingShingle Oh, G.G.
Chim, W.K.
Chan, D.S.H.
Lou, C.L.
Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
author_sort Oh, G.G.
title Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_short Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_full Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_fullStr Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_full_unstemmed Series resistance and effective channel mobility degradation in LDD NMOSFETs under hot-carrier stressing
title_sort series resistance and effective channel mobility degradation in ldd nmosfets under hot-carrier stressing
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/81737
_version_ 1681089125653938176