Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums
10.1063/1.1372662
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sg-nus-scholar.10635-819752023-10-27T08:29:46Z Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums Liu, L. Wang, Y. Gong, H. MATERIALS SCIENCE ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1372662 Journal of Applied Physics 90 1 416-420 JAPIA 2014-10-07T04:23:54Z 2014-10-07T04:23:54Z 2001-07 Article Liu, L., Wang, Y., Gong, H. (2001-07). Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums. Journal of Applied Physics 90 (1) : 416-420. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1372662 00218979 http://scholarbank.nus.edu.sg/handle/10635/81975 000169361100063 Scopus |
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MATERIALS SCIENCE |
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MATERIALS SCIENCE Liu, L. Wang, Y. Gong, H. |
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Liu, L. Wang, Y. Gong, H. |
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Liu, L. Wang, Y. Gong, H. Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums |
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Liu, L. |
title |
Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums |
title_short |
Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums |
title_full |
Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums |
title_fullStr |
Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums |
title_full_unstemmed |
Annealing effects of tantalum films on Si and SiO2/Si substrates in various vacuums |
title_sort |
annealing effects of tantalum films on si and sio2/si substrates in various vacuums |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/81975 |
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