The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure

10.1016/S0921-5107(01)00618-3

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Bibliographic Details
Main Authors: Latt, K.M., Lee, Y.K., Li, S., Osipowicz, T., Seng, H.L.
Other Authors: PHYSICS
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/98282
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Institution: National University of Singapore