The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure
10.1016/S0921-5107(01)00618-3
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Main Authors: | , , , , |
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Other Authors: | |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/98282 |
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Institution: | National University of Singapore |