The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure
10.1016/S0921-5107(01)00618-3
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2014
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sg-nus-scholar.10635-982822024-11-12T02:04:26Z The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure Latt, K.M. Lee, Y.K. Li, S. Osipowicz, T. Seng, H.L. PHYSICS Diffusion barrier Ionized metal plasma (IMP) Tantalum nitride (TaN) 10.1016/S0921-5107(01)00618-3 Materials Science and Engineering B: Solid-State Materials for Advanced Technology 84 3 217-223 MSBTE 2014-10-16T09:45:08Z 2014-10-16T09:45:08Z 2001-07-20 Article Latt, K.M., Lee, Y.K., Li, S., Osipowicz, T., Seng, H.L. (2001-07-20). The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 84 (3) : 217-223. ScholarBank@NUS Repository. https://doi.org/10.1016/S0921-5107(01)00618-3 09215107 http://scholarbank.nus.edu.sg/handle/10635/98282 000169672200014 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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Diffusion barrier Ionized metal plasma (IMP) Tantalum nitride (TaN) |
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Diffusion barrier Ionized metal plasma (IMP) Tantalum nitride (TaN) Latt, K.M. Lee, Y.K. Li, S. Osipowicz, T. Seng, H.L. The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure |
| description |
10.1016/S0921-5107(01)00618-3 |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Latt, K.M. Lee, Y.K. Li, S. Osipowicz, T. Seng, H.L. |
| format |
Article |
| author |
Latt, K.M. Lee, Y.K. Li, S. Osipowicz, T. Seng, H.L. |
| author_sort |
Latt, K.M. |
| title |
The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure |
| title_short |
The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure |
| title_full |
The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure |
| title_fullStr |
The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure |
| title_full_unstemmed |
The impact of layer thickness of IMP-deposited tantalum nitride films on integrity of Cu/TaN/SiO2/Si multilayer structure |
| title_sort |
impact of layer thickness of imp-deposited tantalum nitride films on integrity of cu/tan/sio2/si multilayer structure |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/98282 |
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1821202252335939584 |