Effective method for preparation of oxide-free Ge2Sb 2Te5 surface: An X-ray photoelectron spectroscopy study

• Main Authors: Zhang, Z., Pan, J., Foo, Y.L., Fang, L.W.-W., Yeo, Y.-C., Zhao, R., Shi, L., Chong, T.-C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Subjects: Ge2Sb2Te 5; Phase change; Surface cleaning; XPS
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82215
• Institution: National University of Singapore

10.1016/j.apsusc.2010.06.039