Effects of in situ magnetic field application and post-deposition magnetic annealing on sputtered Fe50Mn50/Ni80Fe20 bilayers

10.1016/S0304-8853(02)00448-1

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Bibliographic Details
Main Authors:	Ng, V., Chen, F.H., Adeyeye, A.O.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Exchange bias Magnetic field sputtering Post-deposition magnetic annealing
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82229
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Institution:	National University of Singapore

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