Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers

10.1063/1.1557243

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Bibliographic Details
Main Authors: Chen, F.H., Ng, V., Adeyeye, A.O.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83679
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Institution: National University of Singapore