Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers

Effects of in situ magnetic field application and postdeposition magnetic annealing on sputtered Ni80Fe20/Fe50Mn50/Ni80Fe 20 trilayers

10.1063/1.1557243

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Bibliographic Details
Main Authors:	Chen, F.H., Ng, V., Adeyeye, A.O.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83679
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

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