Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex

10.1088/0268-1242/17/2/309

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Main Authors: Samanta, S.K., Bera, L.K., Benerjee, H.D., Maiti, C.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82239
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-822392023-10-30T22:33:24Z Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex Samanta, S.K. Bera, L.K. Benerjee, H.D. Maiti, C.K. ELECTRICAL & COMPUTER ENGINEERING 10.1088/0268-1242/17/2/309 Semiconductor Science and Technology 17 2 141-144 SSTEE 2014-10-07T04:27:01Z 2014-10-07T04:27:01Z 2002-02 Article Samanta, S.K., Bera, L.K., Benerjee, H.D., Maiti, C.K. (2002-02). Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex. Semiconductor Science and Technology 17 (2) : 141-144. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/17/2/309 02681242 http://scholarbank.nus.edu.sg/handle/10635/82239 000174582800011 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1088/0268-1242/17/2/309
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Samanta, S.K.
Bera, L.K.
Benerjee, H.D.
Maiti, C.K.
format Article
author Samanta, S.K.
Bera, L.K.
Benerjee, H.D.
Maiti, C.K.
spellingShingle Samanta, S.K.
Bera, L.K.
Benerjee, H.D.
Maiti, C.K.
Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex
author_sort Samanta, S.K.
title Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex
title_short Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex
title_full Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex
title_fullStr Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex
title_full_unstemmed Effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-Si1-xGex
title_sort effects of thermal annealing on the electrical properties of tetraethylorthosilicate-based oxynitride films deposited on strained-si1-xgex
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82239
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