ICP etching and structure study of PECVD SiC films

International Journal of Modern Physics B

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Bibliographic Details
Main Authors: Shi, J., Choi, W.K., Chor, E.F.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83810
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-838102015-01-21T19:41:03Z ICP etching and structure study of PECVD SiC films Shi, J. Choi, W.K. Chor, E.F. ELECTRICAL & COMPUTER ENGINEERING International Journal of Modern Physics B 16 28-29 4318-4322 IJPBE 2014-10-07T04:45:26Z 2014-10-07T04:45:26Z 2002-11-20 Conference Paper Shi, J.,Choi, W.K.,Chor, E.F. (2002-11-20). ICP etching and structure study of PECVD SiC films. International Journal of Modern Physics B 16 (28-29) : 4318-4322. ScholarBank@NUS Repository. 02179792 http://scholarbank.nus.edu.sg/handle/10635/83810 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description International Journal of Modern Physics B
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Shi, J.
Choi, W.K.
Chor, E.F.
format Conference or Workshop Item
author Shi, J.
Choi, W.K.
Chor, E.F.
spellingShingle Shi, J.
Choi, W.K.
Chor, E.F.
ICP etching and structure study of PECVD SiC films
author_sort Shi, J.
title ICP etching and structure study of PECVD SiC films
title_short ICP etching and structure study of PECVD SiC films
title_full ICP etching and structure study of PECVD SiC films
title_fullStr ICP etching and structure study of PECVD SiC films
title_full_unstemmed ICP etching and structure study of PECVD SiC films
title_sort icp etching and structure study of pecvd sic films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83810
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