ICP etching and structure study of PECVD SiC films
International Journal of Modern Physics B
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2014
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sg-nus-scholar.10635-838102015-01-21T19:41:03Z ICP etching and structure study of PECVD SiC films Shi, J. Choi, W.K. Chor, E.F. ELECTRICAL & COMPUTER ENGINEERING International Journal of Modern Physics B 16 28-29 4318-4322 IJPBE 2014-10-07T04:45:26Z 2014-10-07T04:45:26Z 2002-11-20 Conference Paper Shi, J.,Choi, W.K.,Chor, E.F. (2002-11-20). ICP etching and structure study of PECVD SiC films. International Journal of Modern Physics B 16 (28-29) : 4318-4322. ScholarBank@NUS Repository. 02179792 http://scholarbank.nus.edu.sg/handle/10635/83810 NOT_IN_WOS Scopus |
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International Journal of Modern Physics B |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Shi, J. Choi, W.K. Chor, E.F. |
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Conference or Workshop Item |
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Shi, J. Choi, W.K. Chor, E.F. |
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Shi, J. Choi, W.K. Chor, E.F. ICP etching and structure study of PECVD SiC films |
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Shi, J. |
title |
ICP etching and structure study of PECVD SiC films |
title_short |
ICP etching and structure study of PECVD SiC films |
title_full |
ICP etching and structure study of PECVD SiC films |
title_fullStr |
ICP etching and structure study of PECVD SiC films |
title_full_unstemmed |
ICP etching and structure study of PECVD SiC films |
title_sort |
icp etching and structure study of pecvd sic films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/83810 |
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